Invention Application
- Patent Title: Assisting FGL oscillations with perpendicular anisotropy for MAMR
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Application No.: US12927699Application Date: 2010-11-22
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Publication No.: US20120126905A1Publication Date: 2012-05-24
- Inventor: Kunliang Zhang , Min Li , Yuchen Zhou
- Applicant: Kunliang Zhang , Min Li , Yuchen Zhou
- Assignee: Headway Technologies, Inc.
- Current Assignee: Headway Technologies, Inc.
- Main IPC: H03B28/00
- IPC: H03B28/00 ; B05D5/00

Abstract:
A spin transfer oscillator (STO) structure is disclosed that includes two assist layers with perpendicular magnetic anisotropy (PMA) to enable a field generation layer (FGL) to achieve an oscillation state at lower current density for MAMR applications. In one embodiment, the STO is formed between a main pole and write shield and the FGL has a synthetic anti-ferromagnetic structure. The STO configuration may be represented by seed layer/spin injection layer (SIL)/spacer/PMA layer 1/FGL/spacer/PMA layer 2/capping layer. The spacer may be Cu for giant magnetoresistive (GMR) devices or a metal oxide for tunneling magnetoresistive (TMR) devices. Alternatively, the FGL is a single ferromagnetic layer and the second PMA assist layer has a synthetic structure including two PMA layers with magnetic moment in opposite directions in a seed layer/SIL/spacer/PMA assist 1/FGL/spacer/PMA assist 2/capping layer configuration. SIL and PMA assist layers are laminates of (CoFe/Ni)x or the like.
Public/Granted literature
- US08274811B2 Assisting FGL oscillations with perpendicular anisotropy for MAMR Public/Granted day:2012-09-25
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