发明申请
- 专利标题: SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- 专利标题(中): 半导体器件及其制造方法
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申请号: US13340165申请日: 2011-12-29
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公开(公告)号: US20120091583A1公开(公告)日: 2012-04-19
- 发明人: Michihiro KAWASHITA , Yasuhiro Yoshimura , Naotaka Tanaka , Takahiro Naito , Takashi Akazawa
- 申请人: Michihiro KAWASHITA , Yasuhiro Yoshimura , Naotaka Tanaka , Takahiro Naito , Takashi Akazawa
- 优先权: JPJP2008-323581 20081219
- 主分类号: H01L23/498
- IPC分类号: H01L23/498
摘要:
In a semiconductor device in which a plurality of semiconductor chips are stacked, performance is enhanced without deteriorating productivity. The semiconductor device has a plurality of elements, an interlayer insulating film, a pad, and a bump electrode electrically connected with the pad sequentially formed on a main surface of a silicon substrate and has a back-surface electrode formed on a back surface of the silicon substrate and electrically connected with the bump electrode. The bump electrode has a protruding portion penetrating through the pad and protruding toward the silicon substrate side. The back-surface electrode is formed so as to reach the protruding portion of the bump electrode from the back surface side of the silicon substrate toward the main surface side and to cover the inside of a back-surface electrode hole portion which does not reach the pad, so that the back-surface electrode is electrically connected with the bump electrode.
公开/授权文献
- US08816506B2 Semiconductor device and method of manufacturing the same 公开/授权日:2014-08-26
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