发明申请
- 专利标题： SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
- 专利标题（中）： 含有它的盐和光催化剂组合物
-
申请号： US13027344申请日： 2011-02-15
-
公开(公告)号： US20110200940A1公开(公告)日： 2011-08-18
- 发明人: Koji ICHIKAWA , Hiromu SAKAMOTO
- 申请人： Koji ICHIKAWA , Hiromu SAKAMOTO
- 申请人地址： JP Tokyo
- 专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人地址： JP Tokyo
- 优先权： JP2010-033422 20100218
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; C08F14/18 ; G03F7/20 ; C07C309/00 ; C07C69/76 ; C07D333/22
摘要：
The present invention provides a salt represented by the formula (I): wherein R1 and R2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO— and which can have one or more fluorine atoms, R3 represents a hydrogen atom or a methyl group, and Z1+ represents an organic counter cation, and a photoresist composition containing the same.
公开/授权文献
- US08906589B2 Salt and photoresist composition comprising the same 公开/授权日：2014-12-09
信息查询
IPC分类:
