Invention Application
- Patent Title: NITRIDE SEMICONDUCTOR CRYSTAL AND ITS PRODUCTION METHOD
- Patent Title (中): 氮化物半导体晶体及其生产方法
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Application No.: US12920976Application Date: 2009-03-02
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Publication No.: US20110129669A1Publication Date: 2011-06-02
- Inventor: Kenji Fujito , Shuichi Kubo , Yoko Mashige
- Applicant: Kenji Fujito , Shuichi Kubo , Yoko Mashige
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Chemical Corporation
- Current Assignee: Mitsubishi Chemical Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2008052587 20080303
- International Application: PCT/JP2009/053893 WO 20090302
- Main IPC: C30B29/40
- IPC: C30B29/40 ; C30B25/02 ; C30B25/16 ; C30B25/18 ; C01B21/00

Abstract:
A method for efficiently producing a plate-like nitride semiconductor crystal having the desired principal plane in a simple method is provided. A raw material gas is fed to a seed crystal in which a ratio (L/W) of length L in a longitudinal direction and maximum width W, of a plane of projection obtained by projecting a crystal growth face on the seed crystal in a growth direction is from 2 to 400, and the maximum width W is 5 mm or less, thereby growing a plate-like semiconductor crystal on the seed crystal.
Public/Granted literature
- US08545626B2 Nitride semiconductor crystal and its production method Public/Granted day:2013-10-01
Information query
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