发明申请
- 专利标题: METHODS OF CLEANING COMPONENTS HAVING INTERNAL PASSAGES
- 专利标题(中): 具有内部通道清洁组件的方法
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申请号: US12617479申请日: 2009-11-12
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公开(公告)号: US20110112002A1公开(公告)日: 2011-05-12
- 发明人: Timothy Hudson , William F. Hehmann , Rajiv Ratna Singh , Phil Roark , Ryan Hulse , Andrew Poss
- 申请人: Timothy Hudson , William F. Hehmann , Rajiv Ratna Singh , Phil Roark , Ryan Hulse , Andrew Poss
- 申请人地址: US NJ Morristown
- 专利权人: HONEYWELL INTERNATIONAL INC.
- 当前专利权人: HONEYWELL INTERNATIONAL INC.
- 当前专利权人地址: US NJ Morristown
- 主分类号: C11D1/02
- IPC分类号: C11D1/02
摘要:
Methods are provided for cleaning a component having internal passages. A method includes contacting the component with an aqueous hydrogen fluoride solution without agitating the solution for a time period in a range of about 20 minutes to about an hour to dissolve a solid piece of blockage material blocking at least a portion of the internal passages, the aqueous hydrogen fluoride solution comprising, by volume, about 40 percent to about 60 percent hydrogen fluoride and optionally, a corrosion inhibitor, and the blockage material comprising a silicate and rinsing the component with water to remove at least a portion of the aqueous hydrogen fluoride solution from surfaces of the component defining at least a portion of the internal passages.
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