发明申请
US20110112002A1 METHODS OF CLEANING COMPONENTS HAVING INTERNAL PASSAGES 审中-公开
具有内部通道清​​洁组件的方法

METHODS OF CLEANING COMPONENTS HAVING INTERNAL PASSAGES
摘要:
Methods are provided for cleaning a component having internal passages. A method includes contacting the component with an aqueous hydrogen fluoride solution without agitating the solution for a time period in a range of about 20 minutes to about an hour to dissolve a solid piece of blockage material blocking at least a portion of the internal passages, the aqueous hydrogen fluoride solution comprising, by volume, about 40 percent to about 60 percent hydrogen fluoride and optionally, a corrosion inhibitor, and the blockage material comprising a silicate and rinsing the component with water to remove at least a portion of the aqueous hydrogen fluoride solution from surfaces of the component defining at least a portion of the internal passages.
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