Invention Application
- Patent Title: NITRIDE-BASED SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
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Application No.: US12937758Application Date: 2010-03-17
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Publication No.: US20110037089A1Publication Date: 2011-02-17
- Inventor: Mitsuaki Oya , Toshiya Yokogawa , Atsushi Yamada , Akihiro Isozaki
- Applicant: Mitsuaki Oya , Toshiya Yokogawa , Atsushi Yamada , Akihiro Isozaki
- Priority: JP2009-091514 20090403; JPPCT/JP2009/007284 20091225
- International Application: PCT/JP2010/001921 WO 20100317
- Main IPC: H01L33/40
- IPC: H01L33/40 ; H01L21/20 ; H01L29/20

Abstract:
A nitride-based semiconductor light-emitting device 100 includes: a GaN substrate 10 with an m-plane surface 12; a semiconductor multilayer structure 20 provided on the m-plane surface 12 of the GaN substrate 10; and an electrode 30 provided on the semiconductor multilayer structure 20. The electrode 30 includes a Zn layer 32 and an Ag layer 34 provided on the Zn layer 32. The Zn layer 32 is in contact with a surface of a p-type semiconductor region of the semiconductor multilayer structure 20.
Public/Granted literature
- US08334199B2 Method for fabricating nitride-based semiconductor device having electrode on m-plane Public/Granted day:2012-12-18
Information query
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