Invention Application
- Patent Title: PHASE CHANGE MEMORY DEVICE HAVING AN IMPROVED WORD LINE RESISTANCE, AND METHODS OF MAKING SAME
- Patent Title (中): 具有改进的字线电阻的相变存储器件及其制造方法
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Application No.: US12635950Application Date: 2009-12-11
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Publication No.: US20100327249A1Publication Date: 2010-12-30
- Inventor: Mi Ra CHOI , Jang Uk LEE
- Applicant: Mi Ra CHOI , Jang Uk LEE
- Applicant Address: KR Gyeonggi-do
- Assignee: HYNIX SEMICONDUCTOR INC.
- Current Assignee: HYNIX SEMICONDUCTOR INC.
- Current Assignee Address: KR Gyeonggi-do
- Priority: KR10-2009-0058931 20090630
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L29/18 ; H01L21/06

Abstract:
A phase change memory device having an improved word line resistance and a fabrication method of making the same are presented. The phase change memory device includes a semiconductor substrate, a word line, an interlayer insulation film, a strapping line, a plurality of current paths, a switching element, and a phase change variable resistor. The word line is formed in a cell area of the semiconductor substrate. The interlayer insulation film formed on the word line. The strapping line is formed on the interlayer insulation film such that the strapping line overlaps on top of the word line. The current paths electrically connect together the word line with the strapping line. The switching element is electrically connected to the strapping line. The phase change variable resistor is electrically connected to the switching element.
Public/Granted literature
- US08283651B2 Phase change memory device having an improved word line resistance, and methods of making same Public/Granted day:2012-10-09
Information query
IPC分类: