Invention Application
- Patent Title: Cold Cathode Electron Emission Source and Method for Manufacture of the Same
- Patent Title (中): 冷阴极电子发射源及其制造方法
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Application No.: US12726115Application Date: 2010-03-17
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Publication No.: US20100237763A1Publication Date: 2010-09-23
- Inventor: Takao Shiraga , Kazunori Kitagawa , Toshio Kaneshige , Norio Nishimura
- Applicant: Takao Shiraga , Kazunori Kitagawa , Toshio Kaneshige , Norio Nishimura
- Priority: JP2009-068035 20090319
- Main IPC: H01J1/30
- IPC: H01J1/30 ; H01B13/00

Abstract:
The present invention provides a novel method for the manufacture of an enhanced cold cathode electron emission source allowing a measure of area to be processed at one time. The method includes the steps of: dissolving first and second polymers in solvent to obtain a polymer solution, and applying the polymer solution onto a second conductive layer before forming a hole; precipitating and immobilizing the first polymer in a particulate in the second polymer by evaporating the solvent; removing the first polymer particulate with a developer to form an etching hole in the second polymer; and performing etching process via the etching hole so as to form the hole in the second conductive layer. In one embodiment, the second polymer has greater solubility than the first polymer in the solvent, and the first polymer has greater solubility than the second polymer in the developer.
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