发明申请
- 专利标题: FLUORENE-BASED POLYMER CONTAINING URETHANE GROUPS, PREPARATION METHOD THEREOF AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME
- 专利标题(中): 含有脲基的聚合物,其制备方法及包含其的负型类型的感光性树脂组合物
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申请号: US12671348申请日: 2008-09-26
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公开(公告)号: US20100201925A1公开(公告)日: 2010-08-12
- 发明人: Han Soo Kim , Sung Hyun Kim , Dong Chang Choi , Kyung Soo Choi , Ho Chan Ji , Min Young Lim , Geun Young Cha , Yoon Hee Heo , Ji Heum Yoo , Sun Hwa Kim
- 申请人: Han Soo Kim , Sung Hyun Kim , Dong Chang Choi , Kyung Soo Choi , Ho Chan Ji , Min Young Lim , Geun Young Cha , Yoon Hee Heo , Ji Heum Yoo , Sun Hwa Kim
- 申请人地址: KR Seoul
- 专利权人: LG CHEM LTD.
- 当前专利权人: LG CHEM LTD.
- 当前专利权人地址: KR Seoul
- 优先权: KR10-2007-0102679 20071011; KR10-2008-0094047 20080925
- 国际申请: PCT/KR2008/005707 WO 20080926
- 主分类号: G02F1/1335
- IPC分类号: G02F1/1335 ; C08L75/04 ; G03F7/004
摘要:
Provided is a novel fluorene-based polymer having urethane bonds and a method for preparing the fluorene-based polymer. According to the method, a diol compound is condensed with a diisocyanate instead of an acid dianhydride, and then an acid anhydride is reacted with the reaction mixture to introduce desired acid groups into the final polymer. Further provided is a negative-type photosensitive resin composition comprising of the fluorene-based polymer as a binder resin. The composition exhibits improved chemical resistance, good development margin and high sensitivity due to presence of the acid groups despite the low molecular weight of the fluorene-based polymer.
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