发明申请
- 专利标题: THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME AND MASK FOR MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE
- 专利标题(中): 薄膜晶体管基板及其制造方法和制造薄膜晶体管基板的掩模
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申请号: US12755920申请日: 2010-04-07
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公开(公告)号: US20100197086A1公开(公告)日: 2010-08-05
- 发明人: Do Gi Lim , Jong Hwan Lee , Hong Woo Lee , Yong Jo Kim , Yong Woo Lee
- 申请人: Do Gi Lim , Jong Hwan Lee , Hong Woo Lee , Yong Jo Kim , Yong Woo Lee
- 优先权: KR10-2006-0010831 20060203; KR10-2006-0012147 20060208
- 主分类号: H01L21/336
- IPC分类号: H01L21/336
摘要:
A thin film transistor substrate, wherein the moving area of electrons between source and drain electrodes of a thin film transistor (TFT) is minimized, the moving distance of electrons is increased, and the sizes of capacitors defined by a gate electrode together with the respective source and drain electrodes are identical to each other so that an off current generated when the TFT is off can be minimized; a method of manufacturing the thin film transistor substrate; and a mask for manufacturing the thin film transistor substrate. Accordingly, it is possible to minimize an off current induced due to a phenomenon of electron trapping by light.
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