发明申请
- 专利标题: METHOD TO FORM A RECESS FOR A MICROFLUIDIC DEVICE
- 专利标题(中): 形成微流体装置的记录方法
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申请号: US12422732申请日: 2009-04-13
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公开(公告)号: US20100163517A1公开(公告)日: 2010-07-01
- 发明人: Fuchao Wang , Ming Fang
- 申请人: Fuchao Wang , Ming Fang
- 申请人地址: US TX Carrollton
- 专利权人: STMicroelectronics, Inc.
- 当前专利权人: STMicroelectronics, Inc.
- 当前专利权人地址: US TX Carrollton
- 主分类号: B44C1/22
- IPC分类号: B44C1/22
摘要:
A method includes forming a recess in a first surface of a substrate, the recess having a width, depth, and height selected to correspond to a width, depth, and height of a fluid chamber, forming a sacrificial material in the recess, forming a first heater element, forming a metal layer overlying the first heater element, and forming a nozzle opening in the metal layer to expose the sacrificial material. The method also includes forming a path from a second surface of the substrate to expose the sacrificial material and removing the sacrificial material from the recess to expose the chamber with the selected width, depth, and height, the chamber in fluid communication with the path, the nozzle opening, and a surrounding environment.
公开/授权文献
- US08110117B2 Method to form a recess for a microfluidic device 公开/授权日:2012-02-07
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