Invention Application
US20100159138A1 RESIST SOLUTION AND METHOD OF FORMING PATTERN USING THE SAME
审中-公开
使用其形成图案的耐力解决方案和方法
- Patent Title: RESIST SOLUTION AND METHOD OF FORMING PATTERN USING THE SAME
- Patent Title (中): 使用其形成图案的耐力解决方案和方法
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Application No.: US12642156Application Date: 2009-12-18
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Publication No.: US20100159138A1Publication Date: 2010-06-24
- Inventor: Byung Geol KIM , Jin Wuk Kim , Sung Hee Kim
- Applicant: Byung Geol KIM , Jin Wuk Kim , Sung Hee Kim
- Priority: KR10-2008-0133400 20081224
- Main IPC: B05D5/00
- IPC: B05D5/00 ; C08L61/10 ; C08L33/12 ; C08L79/04 ; C08L75/04
Abstract:
A resist solution is discussed. The resist solution includes: a base polymer, a tackifier, a carrier solvent, a printing solvent. The resist solution further includes a methoxy-based silane coupling agent which has a weak affinity for a carrier solvent containing ethanol.
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