发明申请
US20100072574A1 Semiconductor Device and Manufacturing Method Thereof 有权
半导体器件及其制造方法

Semiconductor Device and Manufacturing Method Thereof
摘要:
A resistor whose characteristic value can be changed without requiring a photolithography process again is provided. The resistor includes a plurality of first resistor units which is connected serially to each other and a second resistor unit which is connected in parallel to part of the first resistor units. Then, after the measurement of a semiconductor integrated circuit, the second resistor unit is electrically disconnected as necessary. The first resistor units may be either a unit including a single resistor or may be a unit including a plurality of resistors.
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