Invention Application
- Patent Title: CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
- Patent Title (中): 化学放大正电阻组合物
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Application No.: US12536386Application Date: 2009-08-05
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Publication No.: US20100062365A1Publication Date: 2010-03-11
- Inventor: Masahiko SHIMADA , Kazuhiko HASHIMOTO , Junji SHIGEMATSU , Takayuki MIYAGAWA , Satoshi YAMAMOTO
- Applicant: Masahiko SHIMADA , Kazuhiko HASHIMOTO , Junji SHIGEMATSU , Takayuki MIYAGAWA , Satoshi YAMAMOTO
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Priority: JP2008-203967 20080807
- Main IPC: G03F7/004
- IPC: G03F7/004

Abstract:
The present invention provides a chemically amplified positive composition comprising:(A) a resin comprising a structural unit having an acid-labile group and being itself insoluble or poorly soluble in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid,(B) a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and a structural unit having a fluorine atom in a side chain, andan acid generator.
Public/Granted literature
- US08003296B2 Chemically amplified positive resist composition Public/Granted day:2011-08-23
Information query
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