Invention Application
US20100044824A1 STRATIFIED PHOTODIODE FOR HIGH RESOLUTION CMOS IMAGE SENSOR IMPLEMENTED WITH STI TECHNOLOGY
有权
用于STI技术实现的高分辨率CMOS图像传感器的分光光度
- Patent Title: STRATIFIED PHOTODIODE FOR HIGH RESOLUTION CMOS IMAGE SENSOR IMPLEMENTED WITH STI TECHNOLOGY
- Patent Title (中): 用于STI技术实现的高分辨率CMOS图像传感器的分光光度
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Application No.: US12608731Application Date: 2009-10-29
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Publication No.: US20100044824A1Publication Date: 2010-02-25
- Inventor: Jaroslav Hynecek
- Applicant: Jaroslav Hynecek
- Priority: KR2005-0134243 20051229; KR2006-0038536 20060428
- Main IPC: H01L31/101
- IPC: H01L31/101

Abstract:
A stratified photodiode for high resolution CMOS image sensors implemented with STI technology is provided. The photodiode includes a semi-conductive layer of a first conductivity type, multiple doping regions of a second conductivity type, multiple doping regions of the first conductivity type, and a pinning layer. The multiple doping regions of the second conductivity type are formed to different depths in the semi-conductive layer. The multiple doping regions of the first conductivity type are disposed between the multiple doping regions of the second conductivity type and form multiple junction capacitances without full depletion. In particular, the stratified doping arrangement allows the photodiode to have a small size, high charge storage capacity, low dark current, and low operation voltages.
Public/Granted literature
- US08247853B2 Stratified photodiode for high resolution CMOS image sensor implemented with STI technology Public/Granted day:2012-08-21
Information query
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