- 专利标题: CUTOMIZED LITHOGRAPHIC PARTICLES
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申请号: US12377773申请日: 2007-08-17
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公开(公告)号: US20100035061A1公开(公告)日: 2010-02-11
- 发明人: Thomas G. Mason , Carlos J. Hernandez
- 申请人: Thomas G. Mason , Carlos J. Hernandez
- 申请人地址: US CA Oakland
- 专利权人: The Regents of the University of California
- 当前专利权人: The Regents of the University of California
- 当前专利权人地址: US CA Oakland
- 国际申请: PCT/US07/18365 WO 20070817
- 主分类号: B32B5/16
- IPC分类号: B32B5/16 ; G03F7/00 ; G03B27/42
摘要:
A method of producing particles includes providing a substrate structure that comprises a solid substrate; forming a target structure on said substrate structure, said target structure comprising a radiation-reactive material; forming a spatially patterned beam of radiation using a patterned mask; exposing at least a portion of the target structure to the spatially patterned beam of radiation to which the radiation-reactive material reacts while leaving other portions of the target structure unexposed to the radiation; removing substantially all of one of the exposed or the unexposed patterned portions of the target structure to provide a plurality of non-contiguous structures that include at least a portion of the radiation-reactive material; and separating the plurality of non-contiguous structures comprising the radiation-reactive material from the substrate structure into a fluid material. Each non-contiguous structure of the radiation-reactive material provides at least a portion of a separate particle after the separation.
公开/授权文献
- US08617798B2 Customized lithographic particles 公开/授权日:2013-12-31
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