发明申请
- 专利标题: Multi-Level Nanowire Structure And Method Of Making The Same
- 专利标题(中): 多层次纳米线结构及其制作方法
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申请号: US12243853申请日: 2008-10-01
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公开(公告)号: US20100019355A1公开(公告)日: 2010-01-28
- 发明人: Theodore I Kamins , Nathaniel Quitoriano
- 申请人: Theodore I Kamins , Nathaniel Quitoriano
- 主分类号: H01L21/20
- IPC分类号: H01L21/20 ; H01L29/04
摘要:
A method for making a multi-level nanowire structure includes establishing a first plurality of nanowires on a substrate surface, wherein at least some of the nanowires are i) aligned at a predetermined crystallographically defined angle with respect to the substrate surface, ii) aligned substantially perpendicular with respect to the substrate surface, or iii) combinations of i and ii. An insulating layer is established between the nanowires of the first plurality such that one of two opposed ends of at least some of the nanowires positioned i) at the predetermined crystallographically defined angle, ii) substantially perpendicular with respect to the substrate surface, or iii) combinations of i and ii is exposed. Regions are grown from each of the exposed ends, and such regions coalesce to form a substantially continuous layer on the insulating layer. A second plurality of nanowires is established on the substantially continuous layer.
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