Invention Application
US20090195289A1 Process-Variation Tolerant Diode, Standard Cells Including the Same, Tags and Sensors Containing the Same, and Methods for Manufacturing the Same
有权
过程变异耐受二极管,包括其的标准单元,包含该标准单元的标签和传感器及其制造方法
- Patent Title: Process-Variation Tolerant Diode, Standard Cells Including the Same, Tags and Sensors Containing the Same, and Methods for Manufacturing the Same
- Patent Title (中): 过程变异耐受二极管,包括其的标准单元,包含该标准单元的标签和传感器及其制造方法
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Application No.: US12424509Application Date: 2009-04-15
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Publication No.: US20090195289A1Publication Date: 2009-08-06
- Inventor: Vivek SUBRAMANIAN , Patrick Smith
- Applicant: Vivek SUBRAMANIAN , Patrick Smith
- Main IPC: H03K5/08
- IPC: H03K5/08 ; H01L27/12 ; H01L21/8238

Abstract:
Process variation-tolerant diodes and diode-connected thin film transistors (TFTs), printed or patterned structures (e.g., circuitry) containing such diodes and TFTs, methods of making the same, and applications of the same for identification tags and sensors are disclosed. A patterned structure comprising a complementary pair of diodes or diode-connected TFTs in series can stabilize the threshold voltage (Vt) of a diode manufactured using printing or laser writing techniques. The present invention advantageously utilizes the separation between the Vt of an NMOS TFT (Vtn) and the Vt of a PMOS TFT (Vtp) to establish and/or improve stability of a forward voltage drop across a printed or laser-written diode. Further applications of the present invention relate to reference voltage generators, voltage clamp circuits, methods of controlling voltages on related or differential signal transmission lines, and RFID and EAS tags and sensors.
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