Invention Application
US20090063952A1 SYSTEM FOR VALIDATING A DOCUMENT CONFORMING TO A FIRST SCHEMA WITH RESPECT TO A SECOND SCHEMA
有权
用于对第二张图表符合第一张图表的文件进行验证的系统
- Patent Title: SYSTEM FOR VALIDATING A DOCUMENT CONFORMING TO A FIRST SCHEMA WITH RESPECT TO A SECOND SCHEMA
- Patent Title (中): 用于对第二张图表符合第一张图表的文件进行验证的系统
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Application No.: US12056233Application Date: 2008-03-26
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Publication No.: US20090063952A1Publication Date: 2009-03-05
- Inventor: Mukund Raghavachari , Oded Shmueli
- Applicant: Mukund Raghavachari , Oded Shmueli
- Main IPC: G06F17/00
- IPC: G06F17/00

Abstract:
An improved system for determining compliance between a source document structure in accordance with a source schema and a target schema includes: data storage; and a processor for executing software code. The software code causes the processor to: create a source schema description and a target schema description; receive the source document which includes an ordered tree structure with labeled elements and including a subtree; identify all corresponding element types in the source and target schemas for grouping the corresponding element types into element type pairs; classify each element type pair; and confirm compliance of the source document.
Public/Granted literature
- US08065608B2 System for validating a document conforming to a first schema with respect to a second schema Public/Granted day:2011-11-22
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