The present invention relates to an exposure device for transferring circuit patterns of a mask to a roll-film-shaped object. The exposure device includes a supply reel rotation section that is constituted by a supply reel around which the object is wound and that feeds the object by rotating the supply reel, at least one guide roller for guiding the object fed from the supply reel rotation section, an exposure stage on which the circuit patterns are transferred to the object guided by the guide roller, and an alignment mark forming section which forms, on the object, alignment marks that are used to align the mask with the object and which is positioned between the guide roller and the exposure stage.