发明申请
- 专利标题: METHOD FOR MAKING A CIRCUIT BOARD AND MULTI-LAYER SUBSTRATE WITH PLATED THROUGH HOLES
- 专利标题(中): 制造电路板和多层衬底的方法
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申请号: US11941787申请日: 2007-11-16
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公开(公告)号: US20080271915A1公开(公告)日: 2008-11-06
- 发明人: Chien Hao WANG
- 申请人: Chien Hao WANG
- 申请人地址: TW KAOHSIUNG
- 专利权人: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
- 当前专利权人: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
- 当前专利权人地址: TW KAOHSIUNG
- 优先权: TW095142735 20061117
- 主分类号: H01R12/04
- IPC分类号: H01R12/04 ; H05K3/36
摘要:
A method for making a circuit board includes the following steps. At least two substrates are provided, wherein each substrate includes two surfaces, two circuit layers respective formed on the two surfaces and at least a via passing through the two surfaces. A metal layer is formed on the side wall of the via, wherein the metal layer electrically connects two circuit layers on the two surfaces of each substrate to each other. An insulating film is at least formed on the surface of the metal layer by an electrophoretic deposition process. Vias of two substrates are aligned with each other and two substrates are laminated to each other, so as to form a multi-layer substrate. Another metal layer is formed on the insulating film, wherein each metal layer is an independent electrical channel.
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