发明申请
- 专利标题： Method for manufacturing substrate for making microarray
- 专利标题（中）： 制造微阵列基板的方法
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申请号： US12071885申请日： 2008-02-27
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公开(公告)号： US20080233409A1公开(公告)日： 2008-09-25
- 发明人: Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
- 申请人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
- 申请人地址： JP Tokyo
- 专利权人： SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人： SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人地址： JP Tokyo
- 优先权： JP2007-75386 20070322
- 主分类号： B32B9/04
- IPC分类号： B32B9/04
摘要：
A method for manufacturing a substrate for making a microarray, in which a monomolecular film is not detached when a target molecule is immobilized on the substrate using the monomolecular film having a silicon oxide chain is provided.A method for manufacturing a substrate for making a microarray comprising; at least a step of forming a monomolecular film on the substrate using a silane compound, wherein the monomolecular film is formed using a solution comprising the silane compound and a nitrogen-containing organic base in the step.
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