发明申请
- 专利标题： IRRADIATION WITH HIGH ENERGY IONS FOR SURFACE STRUCTURING AND TREATMENT OF SURFACE PROXIMAL SECTIONS OF OPTICAL ELEMENTS
- 专利标题（中）： 用于表面结构的高能量离子辐射和光学元件的表面临时部分的处理
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申请号： US11950208申请日： 2007-12-04
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公开(公告)号： US20080149858A1公开(公告)日： 2008-06-26
- 发明人: Martin Weiser , Stefan Burkart , Holger Maltor
- 申请人： Martin Weiser , Stefan Burkart , Holger Maltor
- 申请人地址： DE Oberkochen
- 专利权人： Carl Zeiss SMT AG
- 当前专利权人： Carl Zeiss SMT AG
- 当前专利权人地址： DE Oberkochen
- 优先权： DE102006057105.3 20061204
- 主分类号： G21K5/10
- IPC分类号： G21K5/10
摘要：
A method for processing the surface of a component, or the processing of an optical element through an ion beam, directed onto the surface to be processed, so that the surface is lowered and/or removed at least partially, wherein the ions have a kinetic energy of 100 keV or more, as well as optical elements processed by the method.
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