发明申请
US20080149826A1 TECHNIQUES FOR PROVIDING A RIBBON-SHAPED GAS CLUSTER ION BEAM
有权
提供RIBBON型气体聚集体离子束的技术
- 专利标题: TECHNIQUES FOR PROVIDING A RIBBON-SHAPED GAS CLUSTER ION BEAM
- 专利标题(中): 提供RIBBON型气体聚集体离子束的技术
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申请号: US11615290申请日: 2006-12-22
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公开(公告)号: US20080149826A1公开(公告)日: 2008-06-26
- 发明人: Anthony RENAU , Joseph C. Olson , Jonathan Gerald England
- 申请人: Anthony RENAU , Joseph C. Olson , Jonathan Gerald England
- 申请人地址: US MA Gloucester
- 专利权人: Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人: Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人地址: US MA Gloucester
- 主分类号: H01J27/02
- IPC分类号: H01J27/02 ; H01J27/08
摘要:
Techniques for providing a ribbon-shaped gas cluster ion beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for providing a ribbon-shaped gas cluster ion beam. The apparatus may comprise at least one nozzle configured to inject a source gas at a sufficient speed into a low-pressure vacuum space to form gas clusters. The apparatus may also comprise at least one ionizer that causes at least a portion of the gas clusters to be ionized. The apparatus may further comprise a beam-shaping mechanism that forms a ribbon-shaped gas cluster ion beam based on the ionized gas clusters.
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