Invention Application
US20080087938A1 Mask ROM, mask ROM embedded EEPROM and method of fabricating the same
审中-公开
掩模ROM，掩模ROM嵌入式EEPROM及其制造方法
- Patent Title: Mask ROM, mask ROM embedded EEPROM and method of fabricating the same
- Patent Title (中): 掩模ROM，掩模ROM嵌入式EEPROM及其制造方法
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Application No.: US11905629Application Date: 2007-10-03
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Publication No.: US20080087938A1Publication Date: 2008-04-17
- Inventor: Hee-seog Jeon , Jeong-uk Han
- Applicant: Hee-seog Jeon , Jeong-uk Han
- Priority: KR10-2006-97469 20061003
- Main IPC: H01L27/115
- IPC: H01L27/115 ; H01L27/112 ; H01L21/8247
Abstract:
Example embodiments are directed to a mask ROM, a mask ROM embedded EEPROM and a method of fabricating the same. The mask ROM may include a select gate pattern and a memory gate pattern disposed between a source region and a drain region at each of the on-cell and the off-cell. The on-cell may include a cell diffusion region between the select gate pattern and the memory gate pattern.
Information query
IPC分类:
