发明申请
- 专利标题: Magnetoresistance effect element, substrate therefor and manufacturing method thereof
- 专利标题(中): 磁阻效应元件及其制造方法
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申请号: US11713050申请日: 2007-03-02
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公开(公告)号: US20070205766A1公开(公告)日: 2007-09-06
- 发明人: Futoyoshi Kou
- 申请人: Futoyoshi Kou
- 优先权: JP2006-057986 20060303; JP2006-058012 20060303
- 主分类号: G01R33/02
- IPC分类号: G01R33/02
摘要:
A magnetoresistance effect element which is used in a magnetic sensor is disclosed. The magnetoresistance effect element includes a soft layer whose magnetization easy direction is changed by a direction of an external magnetic field, and a magnetization fixing layer whose magnetization direction is fixed by having a magnetic layer and an anti-ferromagnetic layer. A magnetoresistance effect is generated by a change of electric conduction which is caused by a relative angle between the magnetization easy direction of the soft layer and the magnetization direction of the magnetization fixing layer. When the magnetic sensor includes two or more magnetoresistance effect elements for having two-axis or more vectors of the magnetization directions, the two or more magnetoresistance effect elements are adjacently disposed.
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