发明申请
- 专利标题: METHOD OF ADJUSTING PATTERN DENSITY
- 专利标题(中): 调整图案密度的方法
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申请号: US11625569申请日: 2007-01-22
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公开(公告)号: US20070174802A1公开(公告)日: 2007-07-26
- 发明人: Jae-Pil SHIN , Moon-Hyun Yoo , Jong-Bae Lee , Jin-Sook Choi , Sung Gyu Park
- 申请人: Jae-Pil SHIN , Moon-Hyun Yoo , Jong-Bae Lee , Jin-Sook Choi , Sung Gyu Park
- 优先权: KR2006-06882 20060123
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
A method of adjusting pattern density includes determining a reference pattern density, defining dummy generation fields and designed patterns, forming basic dummy patterns on the dummy generation fields, evaluating a total pattern density from a sum of a density of the designed patterns and a density of the basic dummy patterns, adjusting a size of the basic dummy patterns so that the total pattern density reaches the reference pattern density, and combining data of the adjusted dummy patterns with data of the designed patterns.
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