发明申请
- 专利标题: High-frequency treatment apparatus
- 专利标题(中): 高频治疗仪
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申请号: US11601859申请日: 2006-11-17
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公开(公告)号: US20070093812A1公开(公告)日: 2007-04-26
- 发明人: Tsuyoshi Hayashida , Kazunori Taniguchi , Shigeo Nagayama , Kazuya Hijii
- 申请人: Tsuyoshi Hayashida , Kazunori Taniguchi , Shigeo Nagayama , Kazuya Hijii
- 申请人地址: JP Tokyo
- 专利权人: Olympus Corporation
- 当前专利权人: Olympus Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JP2004-292956 20041005; JP2004-353425 20041206
- 主分类号: A61B18/14
- IPC分类号: A61B18/14
摘要:
The present invention provides a high-frequency treatment apparatus including: an electrode assembly electrically connected to a high-frequency generating unit for generating a high-frequency current, the assembly having, at the distal end thereof, a current-applying electrode for discharging the high-frequency current, the proximal end of the current-applying electrode being covered with an insulator; an insertion section receiving the electrode assembly, the insertion section being located on the return side of the high-frequency current discharged from the current-applying electrode; a liquid supply section for supplying an irrigation liquid to the vicinity of the current-applying electrode; and an opening section provided at the distal end part of the insulator, the opening section supplying a gas to the vicinity of the current-applying electrode.
公开/授权文献
- US07682359B2 High-frequency treatment apparatus 公开/授权日:2010-03-23
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