Invention Application
US20070018114A1 Resonance method for production of intense low-impurity ion beams of atoms and molecules
有权
用于生成原子和分子的强低杂质离子束的共振方法
- Patent Title: Resonance method for production of intense low-impurity ion beams of atoms and molecules
- Patent Title (中): 用于生成原子和分子的强低杂质离子束的共振方法
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Application No.: US11185141Application Date: 2005-07-20
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Publication No.: US20070018114A1Publication Date: 2007-01-25
- Inventor: Kenneth Purser , Albert Litherland , Norman Turner
- Applicant: Kenneth Purser , Albert Litherland , Norman Turner
- Main IPC: H01J27/00
- IPC: H01J27/00

Abstract:
The present invention comprehends a compact and economical apparatus for producing high intensities of a wide variety of wanted positive and negative molecular and atomic ion beams that have been previously impossible to previously produce at useful intensities. In addition, the invention provides a substantial rejection of companion background ions that are frequently simultaneously emitted with the wanted ions. The principle underlying the present invention is resonance ionization-transfer where energy differences between resonant and non-resonant processes are exploited to enhance or attenuate particular charge-changing processes. This new source technique is relevant to the fields of Accelerator Mass Spectroscopy; Molecular Ion Implantation; Generation of Directed Neutral Beams; and Production of Electrons required for Ion Beam Neutralization within magnetic fields. An example having commercial importance is ionization of the decaborane molecule, B10H14 where an almost perfect ionization resonance match occurs between decaborane molecules and arsenic atoms.
Public/Granted literature
- US07365340B2 Resonance method for production of intense low-impurity ion beams of atoms and molecules Public/Granted day:2008-04-29
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