发明申请
- 专利标题: Catalytic enhanced chemical vapor deposition apparatus having efficient filament arrangement structure
- 专利标题(中): 催化增强化学气相沉积装置具有有效的灯丝排列结构
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申请号: US11439350申请日: 2006-05-24
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公开(公告)号: US20060269671A1公开(公告)日: 2006-11-30
- 发明人: Han-Ki Kim , Myung-Soo Huh , Myoung-Soo Kim , Kyu-Sung Lee
- 申请人: Han-Ki Kim , Myung-Soo Huh , Myoung-Soo Kim , Kyu-Sung Lee
- 优先权: KR10-2005-0043827 20050524
- 主分类号: C23C16/00
- IPC分类号: C23C16/00
摘要:
The present invention provides a catalytic enhanced chemical vapor deposition (CVD) apparatus capable of maximizing efficiency of gas use to 80% or more, and obtaining a uniform thin film by efficiently arranging filaments mounted on a shower head of the catalytic enhanced CVD apparatus, thereby uniformly decomposing a deposition source gas. The present invention also provides a method for fabricating an organic electroluminescent device with an inorganic film formed through the catalytic enhanced CVD apparatus.
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