发明申请
US20060269671A1 Catalytic enhanced chemical vapor deposition apparatus having efficient filament arrangement structure 有权
催化增强化学气相沉积装置具有有效的灯丝排列结构

Catalytic enhanced chemical vapor deposition apparatus having efficient filament arrangement structure
摘要:
The present invention provides a catalytic enhanced chemical vapor deposition (CVD) apparatus capable of maximizing efficiency of gas use to 80% or more, and obtaining a uniform thin film by efficiently arranging filaments mounted on a shower head of the catalytic enhanced CVD apparatus, thereby uniformly decomposing a deposition source gas. The present invention also provides a method for fabricating an organic electroluminescent device with an inorganic film formed through the catalytic enhanced CVD apparatus.
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