Invention Application
- Patent Title: Magnetic memory and method of manufacturing the memory
- Patent Title (中): 磁存储器和制造存储器的方法
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Application No.: US10529851Application Date: 2003-09-19
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Publication No.: US20060261425A1Publication Date: 2006-11-23
- Inventor: Katsumi Suemitsu , Kuniko Kikuta
- Applicant: Katsumi Suemitsu , Kuniko Kikuta
- Applicant Address: JP Tokyo
- Assignee: NEC CORPORATION
- Current Assignee: NEC CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2002-290448 20021002
- International Application: PCT/JP03/11956 WO 20030919
- Main IPC: H01L43/00
- IPC: H01L43/00

Abstract:
A magnetic memory includes a substrate, a lower portion structure of a magnetic element, an upper portion structure of the magnetic element, and a sidewall insulating film. The lower portion structure of the magnetic element is a portion of the magnetic element provided on the upside of the substrate. The upper portion structure of the magnetic element is a remaining portion of the magnetic element provided on the upside of the lower portion structure of the magnetic element. The sidewall insulating film is provided to surround the upper portion structure of the magnetic element and is formed of an insulating material. That is, the lower portion structure of the magnetic element is formed from one layer or a plurality of layers on a side close to the substrate, among a plurality of laminated films of the magnetic element provided on the upside of the substrate. The upper portion structure of the magnetic element is formed from layers other than the lower portion structure of the magnetic element among the plurality of laminated films of the magnetic element. Also, the side of the upper portion structure of the magnetic element is electrically insulated from other portions by the sidewall insulating film. That is, it is possible to avoid a short-circuit.
Information query
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