发明申请
- 专利标题: Irradiation system with ion beam
- 专利标题(中): 离子束照射系统
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申请号: US11202100申请日: 2005-08-12
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公开(公告)号: US20060113466A1公开(公告)日: 2006-06-01
- 发明人: Mitsuaki Kabasawa , Mitsukuni Tsukihara , Hiroshi Sogabe
- 申请人: Mitsuaki Kabasawa , Mitsukuni Tsukihara , Hiroshi Sogabe
- 优先权: JP2004-347499 20041130
- 主分类号: B01D59/44
- IPC分类号: B01D59/44
摘要:
An irradiation system comprises a beam generation source, a mass analysis device, a beam transformer, a deflector for scanning which swings the beam reciprocally, a beam parallelizing device, an acceleration/deceleration device, and an energy filtering device. According to this invention, a hybrid angular energy filter generating both electric and magnetic fields to bend trajectories is provided as the energy filtering device. A pair of multi-surface energy slit units each having a plurality of energy slits that are switchable therebetween depending on an ion species for irradiation are further provided on a downstream side of the hybrid angular energy filter. It is possible to selectively irradiate a target wafer with high-current beams from low energy to high energy in the conditions where contamination such as neutral particles, different kinds of dopants, ions with different energies, metal, and dust particles is extremely small in amount.
公开/授权文献
- US07351987B2 Irradiation system with ion beam 公开/授权日:2008-04-01
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