Invention Application
- Patent Title: Magnetic recording medium and method for production thereof
- Patent Title (中): 磁记录介质及其制造方法
-
Application No.: US11246344Application Date: 2005-10-06
-
Publication No.: US20060076233A1Publication Date: 2006-04-13
- Inventor: Yoshinori Honda , Ikuko Takekuma , Ichiro Tamai
- Applicant: Yoshinori Honda , Ikuko Takekuma , Ichiro Tamai
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Priority: JP2004-294550 20041007
- Main IPC: C23C14/00
- IPC: C23C14/00

Abstract:
A reactive sputtering method is provided for producing a magnetic layer in a stable manner with good reproducibility. One aspect of the invention is to form a magnetic layer for a magnetic recording medium without adversely affecting magnetic properties. Carbon oxide gas is added at the time of reactive sputtering. In one embodiment, a method for producing a magnetic recording medium includes forming at least a soft magnetic layer and a magnetic layer above a substrate, wherein forming said magnetic layer includes sputtering with argon gas and carbon oxide gas.
Information query
IPC分类: