发明申请
- 专利标题: Ferroelectric memory and its manufacturing method
- 专利标题(中): 铁电记忆及其制造方法
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申请号: US11200017申请日: 2005-08-10
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公开(公告)号: US20060043446A1公开(公告)日: 2006-03-02
- 发明人: Shinich Fukada
- 申请人: Shinich Fukada
- 申请人地址: JP TOKYO
- 专利权人: SEIKO EPSON CORPORATION
- 当前专利权人: SEIKO EPSON CORPORATION
- 当前专利权人地址: JP TOKYO
- 优先权: JP2004-256043 20040902
- 主分类号: H01L29/94
- IPC分类号: H01L29/94 ; H01L21/00
摘要:
To securely prevent hydrogen from entering a ferroelectric layer of a ferroelectric memory. A first hydrogen barrier layer 5 is formed on the lower side of ferroelectric capacitors 7. Upper surfaces and side surfaces of the ferroelectric capacitors 7 are covered by a second hydrogen barrier layer. All upper electrodes 7c of the plural ferroelectric capacitors 7 to be connected to a common plate line P are connected to one another by an upper wiring layer 91. The upper wiring layer 91 is connected to the plate line P through a lower wiring 32 provided below the ferroelectric capacitors 7. A third hydrogen barrier layer 92 is formed on the upper wiring layer 91 such that all edge sections 92a of the third hydrogen barrier layer 92 come in contact with the first hydrogen barrier layer 5.
公开/授权文献
- US07235834B2 Ferroelectric memory and its manufacturing method 公开/授权日:2007-06-26
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