Invention Application
US20050228147A1 Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance 有权
水性可显影,光敏苯并环丁烯低聚物和具有高耐湿性的聚合物

  • Patent Title: Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance
  • Patent Title (中): 水性可显影,光敏苯并环丁烯低聚物和具有高耐湿性的聚合物
  • Application No.: US11146818
    Application Date: 2005-06-07
  • Publication No.: US20050228147A1
    Publication Date: 2005-10-13
  • Inventor: Ying SoScott BisKeith Watson
  • Applicant: Ying SoScott BisKeith Watson
  • Main IPC: G03F7/023
  • IPC: G03F7/023 G03F7/40 C08G77/00
Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance
Abstract:
The invention is a photoswitchable benzocyclobutene-based polymer that while remaining aqueous developable, avoids the problem of significant moisture uptake. The oligomer or polymer comprises a polymeric backbone, benzocyclobutene reactive groups, and photoswitchable pendant groups. The pendant groups are bonded to the polymeric backbone and are characterized by the presence of a moiety that converts to carboxylic acid upon exposure to activating wavelengths of radiation a carboxylic acid. When the oligomer or polymer is subsequently heated to cause cure of the oligomer or polymer, carbon dioxide is emitted and the group forms a substantially non-polar moiety. The invention is also a method of making such a polymer and a method of forming a patterned film using such a polymer.
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