Invention Application
US20050220990A1 Magnetic film forming method, magnetic pattern forming method and magnetic recording medium manufacturing method
审中-公开
磁性成膜方法，磁性图案形成方法和磁记录介质的制造方法
- Patent Title: Magnetic film forming method, magnetic pattern forming method and magnetic recording medium manufacturing method
- Patent Title (中): 磁性成膜方法，磁性图案形成方法和磁记录介质的制造方法
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Application No.: US11049724Application Date: 2005-02-04
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Publication No.: US20050220990A1Publication Date: 2005-10-06
- Inventor: Tsutomu Aoyama , Shunji Ishio , Hirotaka Ito
- Applicant: Tsutomu Aoyama , Shunji Ishio , Hirotaka Ito
- Applicant Address: JP Tokyo 103-8272
- Assignee: TDK Corporation
- Current Assignee: TDK Corporation
- Current Assignee Address: JP Tokyo 103-8272
- Priority: JPP.2004-030310 20040206
- Main IPC: G11B5/64
- IPC: G11B5/64 ; B05D5/12 ; C23C14/00 ; C23C14/48 ; G11B5/65 ; G11B5/851 ; G11B5/855 ; H01F10/08 ; H01F10/14 ; H01F10/16 ; H01F41/14 ; H01F41/34
Abstract:
An Ag ion 6 is locally implanted into a thin film 4 containing, as main components, at least one of Fe and Co and at least one of Pd and Pt and a heat treatment is then carried out, and a portion 7 into which the Ag ion 6 is implanted becomes a portion 9 having a large coercive force and a portion 8 into which the Ag ion 6 is not locally implanted becomes a portion 10 having a small coercive force.
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