Invention Application
US20040187452A1 Load-lock system, exposure processing system, and device manufacturing method
失效
负载锁定系统,曝光处理系统和器件制造方法
- Patent Title: Load-lock system, exposure processing system, and device manufacturing method
- Patent Title (中): 负载锁定系统,曝光处理系统和器件制造方法
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Application No.: US10809021Application Date: 2004-03-24
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Publication No.: US20040187452A1Publication Date: 2004-09-30
- Inventor: Ryo Edo
- Priority: JP2003-081733 20030325; JP2003-067778 20040310
- Main IPC: B01D050/00
- IPC: B01D050/00

Abstract:
A load-lock system includes a load-lock chamber arranged between a storage port which stores a substrate and a process chamber which processes the substrate in a process space maintained at a pressure lower than that in the storage port, and a dehumidifying unit which forms a dehumidified environment in the load-lock chamber. A system preferably includes another chamber between said storage port and said load-lock chamber, wherein said dehumidifying unit dehumidifies said another chamber.
Public/Granted literature
- US07276097B2 Load-lock system, exposure processing system, and device manufacturing method Public/Granted day:2007-10-02
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