Invention Application
US20040187452A1 Load-lock system, exposure processing system, and device manufacturing method 失效
负载锁定系统,曝光处理系统和器件制造方法

  • Patent Title: Load-lock system, exposure processing system, and device manufacturing method
  • Patent Title (中): 负载锁定系统,曝光处理系统和器件制造方法
  • Application No.: US10809021
    Application Date: 2004-03-24
  • Publication No.: US20040187452A1
    Publication Date: 2004-09-30
  • Inventor: Ryo Edo
  • Priority: JP2003-081733 20030325; JP2003-067778 20040310
  • Main IPC: B01D050/00
  • IPC: B01D050/00
Load-lock system, exposure processing system, and device manufacturing method
Abstract:
A load-lock system includes a load-lock chamber arranged between a storage port which stores a substrate and a process chamber which processes the substrate in a process space maintained at a pressure lower than that in the storage port, and a dehumidifying unit which forms a dehumidified environment in the load-lock chamber. A system preferably includes another chamber between said storage port and said load-lock chamber, wherein said dehumidifying unit dehumidifies said another chamber.
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