Invention Application
- Patent Title: Method of processing silver halide photosensitive material
- Patent Title (中): 卤化银感光材料的加工方法
-
Application No.: US10658607Application Date: 2003-09-10
-
Publication No.: US20040058282A1Publication Date: 2004-03-25
- Inventor: Kimiyasu Mor imura , Kohzaburoh Yamada
- Applicant: FUJI PHOTO FILM CO., LTD.
- Applicant Address: null
- Assignee: FUJI PHOTO FILM CO., LTD.
- Current Assignee: FUJI PHOTO FILM CO., LTD.
- Current Assignee Address: null
- Priority: JP2002-263715 20020910
- Main IPC: G03C005/29
- IPC: G03C005/29 ; G03C005/50 ; G03C007/407 ; G03C001/08 ; G03C001/10 ; G03C001/28 ; G03C001/34

Abstract:
A method of processing, with a developer in which a solution physical development arises, a silver halide photosensitive material containing a compound capable of undergoing a one-electron oxidation to thereby form a one-electron oxidation product thereof which belongs to the following types 1 to 4: Type 1: the one-electron oxidation product being capable of releasing further two or more electrons accompanying a subsequent bond cleavage reaction; Type 2: the one-electron oxidation product being capable of releasing further one electron accompanying a subsequent bond cleavage reaction, and the compound having, in its molecule, two or more groups adsorptive to silver halide; Type 3: the one-electron oxidation product being capable of releasing further one or more electrons after going through a subsequent bond forming reaction; and Type 4: the one-electron oxidation product being capable of releasing further one or more electrons after going through a subsequent intramolecular ring cleavage reaction.
Public/Granted literature
- US06878510B2 Method of processing silver halide photosensitive material Public/Granted day:2005-04-12
Information query