发明申请
- 专利标题： Method for measuring the concentration of impurities in helium by ion mobility spectrometry
- 专利标题（中）： 通过离子迁移谱测量氦中杂质浓度的方法
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申请号： US10601383申请日： 2003-06-23
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公开(公告)号： US20040053420A1公开(公告)日： 2004-03-18
- 发明人: Luca Pusterla , Marco Succi , Antonio Bonucci , Robert Stimac
- 申请人： SAES GETTERS S.p.A.
- 申请人地址： null
- 专利权人： SAES GETTERS S.p.A.
- 当前专利权人： SAES GETTERS S.p.A.
- 当前专利权人地址： null
- 优先权： ITMI2001A000018 20010108
- 主分类号： G01N021/62
- IPC分类号： G01N021/62
摘要：
A method for the quantitative analysis of the concentration of impurities in helium by means of ion mobility spectrometry is described, which consists in using purified argon together with the helium which has to be analyzed for forming the sample, or pure argon as counterflow gas in the separation zone of the instrument, or finally helium-purified argon mixtures both for the sample gas and for the counterflow gas.
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