发明申请
- 专利标题: Coating apparatus
- 专利标题(中): 涂装设备
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申请号: US10367718申请日: 2003-02-19
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公开(公告)号: US20030154918A1公开(公告)日: 2003-08-21
- 发明人: Toshihiro Mandai , Mikio Tomaru , Norio Shibata
- 申请人: FUJI PHOTO FILM CO., LTD.
- 申请人地址: null
- 专利权人: FUJI PHOTO FILM CO., LTD.
- 当前专利权人: FUJI PHOTO FILM CO., LTD.
- 当前专利权人地址: null
- 优先权: JP2002-041010 20020219
- 主分类号: B05C003/02
- IPC分类号: B05C003/02
摘要:
In coating with two slits of a coating slit and a recovering slit, by optimizing the slit clearance of the coating slit and the recovering slit, a coating layer with a very small and even thickness can be obtained. In a coating apparatus in which after a coating liquid is applied to a web to excess through the coating slit, a desired amount of coating liquid is applied to the web by scraping off an excess of coating liquid with a recovering slit, there is provided a slit clearance adjusting device for adjusting the slit clearance of the recovering slit.
公开/授权文献
- US07018474B2 Coating apparatus 公开/授权日:2006-03-28
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