发明申请
- 专利标题: FILTERED MASK ENCLOSURE
- 专利标题(中): 过滤面膜外观
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申请号: US10025258申请日: 2001-12-17
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公开(公告)号: US20030110944A1公开(公告)日: 2003-06-19
- 发明人: Han-Ming Wu , Giang Dao
- 主分类号: B03C003/00
- IPC分类号: B03C003/00
摘要:
The present invention includes a filtered mask enclosure having an exterior portion and interior regions within the exterior portion such that the interior regions have a filtering region and a purging region connected to the filtering region. The present invention further includes a method of removing a first contaminant in a gas phase, a second contaminant in a solid phase, and a third contaminant having an electrical charge from a purge gas and flowing the purge gas through a vicinity of a mask while exposing a wafer with light through the mask.
公开/授权文献
- US06610123B2 Filtered mask enclosure 公开/授权日:2003-08-26
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