Invention Application
- Patent Title: X-ray irradiation apparatus
- Patent Title (中): X射线照射装置
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Application No.: US10102509Application Date: 2002-03-19
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Publication No.: US20020154740A1Publication Date: 2002-10-24
- Inventor: Tzvi Avnery
- Applicant: Advanced Electron Beams, Inc.
- Applicant Address: US MA Wilmington
- Assignee: Advanced Electron Beams, Inc.
- Current Assignee: Advanced Electron Beams, Inc.
- Current Assignee Address: US MA Wilmington
- Main IPC: H01J035/08
- IPC: H01J035/08 ; H01J035/32
Abstract:
An X-ray beam emitter including a vacuum chamber having a target window. An electron generator is positioned within the vacuum chamber for generating electrons that are directed at the target window for forming X-rays. The X-rays pass through the target window in an X-ray beam.
Public/Granted literature
- US06738451B2 X-ray irradiation apparatus Public/Granted day:2004-05-18
Information query
