Invention Application
- Patent Title: Interferometric servo control system for stage metrology
- Patent Title (中): 用于舞台计量的干涉伺服控制系统
-
Application No.: US09879428Application Date: 2001-06-12
-
Publication No.: US20020089671A1Publication Date: 2002-07-11
- Inventor: Henry A. Hill
- Main IPC: G01B009/02
- IPC: G01B009/02
![Interferometric servo control system for stage metrology](/abs-image/US/2002/07/11/US20020089671A1/abs.jpg.150x150.jpg)
Abstract:
The invention features a method for determining non-linear cyclic errors in a metrology system that positions a measurement object under servo-control based on an interferometrically derived position signal. The method includes: translating the measurement object under servo-control at a fixed speed; identifying frequencies of any oscillations in the position of measurement object as it is translated at the fixed speed; and determining amplitude and phase coefficients for sinusoidal components at the identified frequencies which when combined with the position signal suppress the oscillations. The invention also features a method for positioning a measurement object under servo-control based on an interferometrically derived position signal indicative of a position for the measurement object. This method includes: generating a compensated position signal based on the interferometrically derived position signal and at least one correction term that has a sinusoidal dependence on the position of the measurement object; and repositioning the measurement object based on the compensated position signal and a desired position for the measurement object.
Public/Granted literature
- US06747744B2 Interferometric servo control system for stage metrology Public/Granted day:2004-06-08
Information query