Invention Application
US20020089671A1 Interferometric servo control system for stage metrology 失效
用于舞台计量的干涉伺服控制系统

  • Patent Title: Interferometric servo control system for stage metrology
  • Patent Title (中): 用于舞台计量的干涉伺服控制系统
  • Application No.: US09879428
    Application Date: 2001-06-12
  • Publication No.: US20020089671A1
    Publication Date: 2002-07-11
  • Inventor: Henry A. Hill
  • Main IPC: G01B009/02
  • IPC: G01B009/02
Interferometric servo control system for stage metrology
Abstract:
The invention features a method for determining non-linear cyclic errors in a metrology system that positions a measurement object under servo-control based on an interferometrically derived position signal. The method includes: translating the measurement object under servo-control at a fixed speed; identifying frequencies of any oscillations in the position of measurement object as it is translated at the fixed speed; and determining amplitude and phase coefficients for sinusoidal components at the identified frequencies which when combined with the position signal suppress the oscillations. The invention also features a method for positioning a measurement object under servo-control based on an interferometrically derived position signal indicative of a position for the measurement object. This method includes: generating a compensated position signal based on the interferometrically derived position signal and at least one correction term that has a sinusoidal dependence on the position of the measurement object; and repositioning the measurement object based on the compensated position signal and a desired position for the measurement object.
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