- 专利标题: Method for recognizing masked faces, device for recognizing masked faces, and computer storage medium
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申请号: US17555649申请日: 2021-12-20
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公开(公告)号: US12094244B2公开(公告)日: 2024-09-17
- 发明人: Chin-Wei Yang
- 申请人: HONG FU JIN PRECISION INDUSTRY (WuHan) CO., LTD.
- 申请人地址: CN Wuhan
- 专利权人: HONG FU JIN PRECISION INDUSTRY (WuHan) CO., LTD.
- 当前专利权人: HONG FU JIN PRECISION INDUSTRY (WuHan) CO., LTD.
- 当前专利权人地址: CN Wuhan
- 代理机构: ScienBiziP, P.C.
- 主分类号: G06K9/62
- IPC分类号: G06K9/62 ; G06V10/22 ; G06V10/82 ; G06V40/16
摘要:
A method for recognizing masked faces includes: obtaining a face image to be recognized; detecting whether the face image to be recognized has a mask; extracting feature vectors of a whole face in the face image to be recognized when the face image to be recognized does not have a mask; comparing the feature vectors of the whole face with face images in a first database, and outputting a face recognition result; extracting feature vectors of an upper half face in the face image to be recognized when the face image to be recognized has a mask; comparing the feature vectors of the upper half face with face images in a second database, and outputting the face recognition result. The method of the present disclosure processes images of faces with and without masks, expanding application scenario of face recognition and improving the accuracy of recognition.
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