- 专利标题: Chemical liquid and chemical liquid storage body
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申请号: US17139045申请日: 2020-12-31
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公开(公告)号: US12030713B2公开(公告)日: 2024-07-09
- 发明人: Tetsuya Kamimura , Satomi Takahashi , Tadashi Oomatsu , Tetsuya Shimizu
- 申请人: FUJIFILM Corporation
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP 18131747 2018.07.11
- 主分类号: G03F7/32
- IPC分类号: G03F7/32 ; B65D25/14 ; B65D81/26 ; B65D85/00 ; G03F7/00
摘要:
The present invention provides a chemical liquid having excellent defect suppressing properties. The present invention further provides a chemical liquid storage body containing the chemical liquid. The chemical liquid of the present invention is a chemical liquid containing a compound other than an alkane and an alkene, and one or more organic solvents selected from the group consisting of decane and undecane, in which the chemical liquid further contains one or more organic components selected from the group consisting of alkanes having 12 to 50 carbon atoms and alkenes having 12 to 50 carbon atoms, and a content of the organic component is 0.10 to 1,000,000 mass ppt with respect to a total mass of the chemical liquid.
公开/授权文献
- US20210139231A1 CHEMICAL LIQUID AND CHEMICAL LIQUID STORAGE BODY 公开/授权日:2021-05-13
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