The present application relates to a pipetting device and a pipetting method for pipetting, therefore for aspirating and/or dispensing, a metered liquid using a working gas, independently of the flow- and/or wetting characteristics of the metered liquid, wherein a pipetting channel comprises a first working region, of which the known base temperature is in a lower base temperature range, and a second working region, of which the known working temperature is in a working temperature range that is increased with respect to the base temperature range.