Invention Grant
- Patent Title: Negative resist composition and pattern forming process
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Application No.: US17864748Application Date: 2022-07-14
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Publication No.: US11994799B2Publication Date: 2024-05-28
- Inventor: Jun Hatakeyama
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: WHDA, LLP
- Priority: JP 21123215 2021.07.28
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07C303/32 ; C07C309/06 ; C07C309/10 ; C07C309/12 ; C07C309/13 ; C07C381/12 ; G03F7/027 ; G03F7/029 ; G03F7/033 ; G03F7/038 ; G03F7/20 ; G03F7/30
Abstract:
A negative resist composition is provided comprising a base polymer and an acid generator in the form of a sulfonium salt consisting of a sulfonate anion having a maleimide group and a cation having a polymerizable double bond. The resist composition adapted for organic solvent development exhibits a high resolution and improved LWR or CDU.
Public/Granted literature
- US20230116747A1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS Public/Granted day:2023-04-13
Information query
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