The present disclosure provides an imprint template, including: a base substrate, a pattern layer for imprinting and a planarization layer; wherein the planarization layer is located on a surface of the pattern layer facing away from the base substrate, and a surface of the planarization layer facing away from the base substrate is a plane; and the planarization layer and the pattern layer are configured such that under a specific film removing process, the planarization layer is removed while the pattern layer remains. The present disclosure further provides a preparation method of an imprint template, and an imprint method.