Invention Grant
- Patent Title: Resistive material, resistor, and manufacturing method of resistive material
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Application No.: US17600968Application Date: 2020-03-03
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Publication No.: US11965228B2Publication Date: 2024-04-23
- Inventor: Shuhei Matsubara , Keishi Nakamura
- Applicant: KOA CORPORATION
- Applicant Address: JP Nagano
- Assignee: KOA Corporation
- Current Assignee: KOA Corporation
- Current Assignee Address: JP Nagano
- Agency: Honigman LLP
- Priority: JP 19072722 2019.04.05
- International Application: PCT/JP2020/008985 2020.03.03
- International Announcement: WO2020/202988A 2020.10.08
- Date entered country: 2021-10-01
- Main IPC: C22C29/12
- IPC: C22C29/12 ; B22F1/12 ; B22F3/14 ; C04B35/117 ; C04B35/64 ; H01C1/14 ; H01C7/00 ; H01C17/065
Abstract:
The resistive material for sensing current contains: metal particles selected from a group consisting of nichrome, copper-manganese, and copper-nickel; insulating particles selected from a group consisting of alumina, aluminum nitride, silicon nitride, and zirconia; and titanium oxide.
Public/Granted literature
- US20220157497A1 RESISTIVE MATERIAL, RESISTOR, AND MANUFACTURING METHOD OF RESISTIVE MATERIAL Public/Granted day:2022-05-19
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