Invention Grant
- Patent Title: Low-pressure high-flux hollow fiber nanofiltration (NF) membrane, and preparation method and use thereof
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Application No.: US18209578Application Date: 2023-06-14
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Publication No.: US11878271B1Publication Date: 2024-01-23
- Inventor: Jiang Wei , Chulong Chen , Wei Feng
- Applicant: Harris Membrane Clean Technology Inc.
- Applicant Address: US CA Alhambra
- Assignee: HARRIS MEMBRANE CLEAN TECHNOLOGY INC.
- Current Assignee: HARRIS MEMBRANE CLEAN TECHNOLOGY INC.
- Current Assignee Address: US CA Alhambra
- Agency: Bayramoglu Law Offices LLC
- Priority: CN 2210390794.1 2022.04.14
- Main IPC: B01D61/02
- IPC: B01D61/02 ; B01D69/08 ; B01D71/66 ; C02F1/44 ; B01D69/12 ; C02F101/22

Abstract:
A low-pressure high-flux hollow fiber nanofiltration (NF) membrane, and a preparation method and use thereof are provided. The low-pressure high-flux hollow fiber NF membrane includes a base membrane and a negatively-charged separation layer formed on a surface of the base membrane, where a material of the separation layer is a crosslinking product of a negatively-charged sulfonated polymer. The low-pressure high-flux hollow fiber NF membrane of the present disclosure solves the technical problem that the hollow fiber NF membranes in the prior art are difficult to have both high performance and low energy consumption.
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